Simulation of p-n junctions: Present and future challenges for technologies beyond 32 nm
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چکیده
منابع مشابه
Guest Editors' Introduction: System IC Design Challenges beyond 32 nm
&DESIGN OF DEEPLY scaled ICs is rapidly approaching the use of 32-nm lithography technology, and further scaling is already being planned. As the available number of raw transistors increases with each new technology node, the science of building electronic systems from the available devices is being strained to the point of breaking. Challenges such as increasing design complexity, fundamental...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
سال: 2010
ISSN: 2166-2746,2166-2754
DOI: 10.1116/1.3231481